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INM
100 |
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INM
100 IR |
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INM
200 UV |
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INM
300 DUV-UV |
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INH
200 UV |
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INH
300 DUV |
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Vistec
INM 200 UV
Vistec
INH 200 UV ( OEM system )
(
Wide-Field, UV, DUV, Confocal )
Wafer
& Mask Inspection Microscope
半導體晶圓鏡檢顯微鏡
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Vistec
INM 200 可依照應用需要做組配整合 :
- Wide-Field
Microscopy : 明視野, 暗視野, 干涉對比, 螢光,
偏光.
- Confocal
Microscopy : 共軛焦影像斷層掃描觀察
- UV
Microscopy : 超高解析 (
120 nm ) UV 影像擷取
- DUV
Microscopy : 超高解析 (
80 nm ) DUV 影像擷取
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Vistec
INM 200 UV 是晶圓與光罩檢視的最佳光學顯微鏡 (
包括液晶顯示板 LCD, 光碟 CD, 硬碟 Hard-disc,
品管與製程管理應用, 目前, 也包括許多微機電應用
MEMS, Nanotechnology ),
是先進的半導體廠或電子廠所必備的設備.
具有 Leica
獨家的新一代的 HC ( Harmonic Contrast ) 光學技術,
UV ( 120
nm ) 技術, 以及
DUV
( 80 nm ) 技術.
提供最佳光學平衡管理,
超高光學解析, 讓你看到次微米解析,
達到光學解析理論的極限.
使用上最具人性化的人因公學設計,
自動化控制提供最高的投資與使用效益.
Class-1
的規劃, 合符新一代的半導體製程所需. |
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| Vistec
INM 200 UV 的觀察對比可依需要擴充,
包括明視野, 暗視野, 干涉對比,
螢光, 偏光. 例如 : |
明視野
(
BF ) : shapes, layer, etch quality. |
暗視野
(
DF ) : edge roughness, surface impurities. |
螢光
(
FL ) : residual photoresist, contamination |
干涉對比
(
DIC ) : changes in topography or refractive
index. ( 以顏色及亮度改變 ), 表面立體影像觀察. |
| Leica
INM 200 提供給 200
nm 晶圓 ( 或 光罩 ) 觀察, 可擴增共軛焦或UV-影像擷取,
操作上, 只要單一按鍵即可達到自動切換. |
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共軛焦影像
(
Confocal Contrast )
能提高解析
(
小於 0.2 微米 ), 提高觀察對比與景深, 能類似電腦斷層掃描,
讓使用者一層一層做掃描觀察與影像擷取,
配合數位影像系統, 可做 3D 立體重建, 共觀察與量測分析.
在觀察倍數可擴增到 10,000x.
同時,
可同時將共軛焦影像與 DIC (
wide-field ) 影像做重疊觀察與映像擷取,
操作上, 只要單一按鍵即可達到自動切換
( WF -
CF ).
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| 紫外光學技術
(
UV imaging ) 提供超高解析至 120
nm ( 0.12 微米 ), 因應新一代的製程所需.
物鏡為 UV
150x/0.90 365 nm. 只要單一按鍵即可達到自動切換
(
WF - CF or UV ). 具有選配 UV-專用攝影鏡筒模組及
UV-攝影機 ( 類比
或 數位 ). 最高影像擷取倍率
16,000x.
Leica
是擁有全世界最好的 UV 及 DUV
光學顯微鏡製造關鍵技術. |
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微電腦可程式的控制介面
(
Microscope control panel ) 提供最簡易的使用方法,
提高實質的工作效益. 幾乎所有的設定與控制,
由單一按鍵, 皆可輕易的操控顯微鏡.
電控控制
:
光路, 燈源, 光照強度, 光圈, 鏡筒,
物鏡旋轉鼻輪, 調焦, 聚焦, 載物檯
.... 等 ( 依組配而定 ).
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Vistec
INM 200 UV 具有可程式功能鍵 (
function keys ),
讓使用人員單手操控顯微鏡功能.
Ergotube
FSA-V ( 可選配電控式 ),
內間電控分光鏡, 可控制光路
晶圓用的
200 mm 載物台,
有手動及電控兩種供選用. 本公司亦可依照客戶需求,
提供特殊電控載物檯,.光罩 ( mask )
用附加載物盤.
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| Vistec
INH
200 UV
OEM-module,
模組式, 可供客戶組裝於工作機台. |
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0
- 35 度, 連續可調.
適合所有體型的操作人員.
廣視野目鏡提供了 25 mm 視野,
縱使長時間觀察使用,
都不會產生眼睛疲勞或身體的不適. |
選配雙出口攝影鏡筒
(
一般攝影機
及 UV 專用攝影機 ). Leica 具有各種固定倍率或可調倍率的攝影鏡筒.
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| Vistec
( Leica ) INM 200 UV Specifications |
| INM
200 configuration |
Wide-field,
Confocal or UV or DUV maging |
| Optics |
unique
Leica HC optics for all imaging modes, FOV 25 mm. |
| Illumination |
Reflection
& Transmitted Light |
| Imaging
modes ( Contrast Method ) |
Brightfield,
Darkfield, DIC, Fluorescence, Confocal Scanning Contrast, Ultra-Violet Imaging. |
| Light
sources |
12V/100W
Halogen ( RL ) |
| 12V/20W
Halogen ( TL, optional ) |
| Stabilized
power supply, built-in. |
| HG
100, Stabilized, for Confocal contrast &
UV-imaging ( optional ) |
| Automated
functions |
Aperture
selection ( programmable aperture diaphragm
setting ) |
| Image
mode BF, DF, DIC, FL and CF, UV. ( built-in 4x
motorized contrast turret ) |
| Intensity
adaptation for camera and eyepieces. |
| Motor-driven
sextuple objective |
| Nosepiece |
| Dynamic
Laser Autofocus ( optional ) |
| Motorized
Z-drive ( 18 nm resolution ) |
| Objective
magnification range |
Leica
1.6x - 250x objectives |
| Total
magnification range |
Wide-Field
: Max. to 5000x |
| Confocal
Contrast : Max. to 10,000x |
| UV-imaging
: Max. to 16,000x ( Objective : UV 150x/0.90 365
nm ) |
| Resolution |
Wide-Field
: less than 0.3 µm |
| Confocal
: less than 0.2 µm |
| UV
: less than 0.12 µm |
| DUV
: less than 0.08 µm |
| Stage |
Fast
positioning 200 mm X/Y Manual stage ( 200 mm
) |
| Programmable,
Motorized scanning stage 200 mm x 200 mm ( RL / TL
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| Programmable,
Motorized scanning stage 200 mm ( for RL only ) |
| Wafer
( 200 mm ) and universal Mask holder |
| Objective
nosepiece |
Six-place
objective turret, Motorized, programmable. |
| Observation
tube |
Ergonomy
tube FSA-V ( inclinable 0 - 35 degrees ) |
| Ergonomy
tube FSA-V-MOT ( inclinable 0 - 35 degrees,
motorized ) |
| Built-in
motorized Beam splitter |
| Focusing |
Manual
focus through motor drive-focus action is
magnification-dependent ( resolution less than 18
nm ) |
| Semi-automatic
focusing through Z-position memory. |
| Fully
automatic through the Leica LFS focus system for
all imaging modes. |
| Autofocus
repeatability less than 0.1 µm ( objective
100x/0.90 ) lambda 546 nm and
405 -
436 nm.
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| Filter
module |
Optional,
4-filters ( diameter 32 mm ) |
| Confocal
Module |
Automatic
module for Confocal Contrast with 2 confocal
modes. |
| UV-option |
Single
keystroke is required to automatically switch over
to achieve UV imaging. |
| Microscope
dimensions |
W
: 494 mm, Front to Back : 753 mm, Height : 583 mm |
| Electrical
connections |
AC
220 V - 50 Hz |
| AC
110 V - 60 Hz |
| Power
consumption 400 vA max. |
| Others
accessories |
Dual
TV adapter with two cameras ( one for UV
application ) |
| Variable
C-Mount TV adapter |
| Digital
Camera |
| UV-Camera |
| Imaging
software |
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INM
200 UV
INH
200 UV
組配 |
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| INM
200 RL |
Standard
configuration for RL only |
| INM
200 RL / TL |
Standard
configuration for RL & TL |
| INM
200 H |
OEM-module
with LFS for Z-stage focusing |
| INH
200 |
OEM-module
with LFS for Nosepiece focusing |
| INH
200 RH |
Customer
designed OEM-module Review Head |
| INM
200 LWM |
INM
200 for CD measurements |
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Leica
HC-series Objectives for INM-series microscope |
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| UV
150x/0.90 365 nm ( UV objective ) |
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| Vistec
INM 200 Safety & Reliability |
| Class
1 cleanliness |
| ISO
9001 Certified |
| CE-Marking,
full compliance with EU regulations |
| Safety,
IEC 1010 |
| EMI,
CISPR 11/14, EN 55014, IEC 1000 |
| MTBF
: > 2000 h |
| MTBA
: > 1000 h |
| MTTR
: < 2 h ( according to SEMI E10-92 ) |
| Down
time : < 1% unscheduled |
| MTTA
: < 5 min. |
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